DEPOT EN PHASE VAPEUR DE CARBURE DE TITANE NON STOECHIOMETRIQUE: PREDICTIONS THEORIQUES ET EXPERIENCESTEYSSANDIER F; NADAL M; DUCARROIR M et al.1981; REV. INT. HAUTES TEMP. REFRACT.; ISSN 0035-3434; FRA; DA. 1981; VOL. 18; NO 3; PP. 215-226; ABS. ENG; BIBL. 12 REF.Article

Réalisation de revêtements céramiques dans le système V-C-O à partir d'un précurseur organométallique: le vanadocène = Ceramic coatings in the V-C-O system with vanadocene used as an organometallic precursorPoirier, Laurent; Teyssandier, F.1996, 115 p.Thesis

Thermodynamic approach to the OMCVD of titanium carbide from titanocene dichlorideSLIFIRSKI, J; TEYSSANDIER, F.Advanced materials (Weinheim). 1996, Vol 8, Num 11, pp 247-251, issn 0935-9648Article

Précurseurs « métalloorganiques » et dépôt chimique à partir d'une phase gazeuse = Metal-organic precursors and chemical vapor depositionVALADE, L; TEYSSANDIER, F.L' Actualité chimique (Paris. 1973). 1999, Num 2, pp 14-21, issn 0151-9093Article

Titanocene dichloride used as a precursor for the chemical vapor deposition of titanium carbide : influence of gas phase transportSLIFIRSKI, J; TEYSSANDIER, F.Surface & coatings technology. 1996, Vol 80, Num 3, pp 255-263, issn 0257-8972Article

MMa Bulk Polymerization and Its Influence on In Situ Resin Viscosity Comparing Several Chemorheological ModelsTEYSSANDIER, F; LOVE, B. J.Journal of applied polymer science (Print). 2011, Vol 120, Num 3, pp 1367-1371, issn 0021-8995, 5 p.Article

Determination de la composition de solutions solides de TiCxNy par utilisation simultanée de la spectrométrie de rétrodiffusion élastique Rutherford et de l'analyse par réactions nucléaires = Determination of TiC_xNy solid solution composition by simultaneous use of elastic Rutherford backscattering spectrometry and nuclear reaction analysisMOSBAH, M; TEYSSANDIER, F.Journal de microscopie et de spectroscopie électroniques. 1987, Vol 12, Num 5, pp 499-500, issn 0395-9279Article

Etude d'un réacteur destiné à caractériser par effet Raman spontané la phase gazeuse dans le procédé de dépôt chimique en phase vapeur = Conception and realization of a reactor for the gas phase study in the chemical vapour deposition process by Raman spectroscopyBisch, Christophe; Teyssandier, F.1996, 159 p.Thesis

Chemorheology of Photopolymerizable Acrylates Using a Modified Boltzmann Sigmoidal ModelLOVE, B. J; PIGUET RUINET, F; TEYSSANDIER, F et al.Journal of polymer science. Part B. Polymer physics. 2008, Vol 46, Num 21, pp 2319-2325, issn 0887-6266, 7 p.Article

Réflexions sur des possibilités d'amélioration de la résistance à l'oxydation des matériaux carbonés = Remarks for the improvement of the resistance against oxidation of carbon bearing materialsDERRE, A; DUCARROIR, M; TEYSSANDIER, F et al.Revue internationale des hautes températures et des réfractaires. 1994, Vol 29, Num 1, pp 11-35, issn 0035-3434Article

Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-Cl-HTOUANEN, M; TEYSSANDIER, F; DUCARROIR, M et al.Journal of materials science letters. 1989, Vol 8, Num 1, pp 98-101, issn 0261-8028Article

Titanium carbide coatings on steel: study of the conditions of elaboration and of substrate-coating interactions = Revêtement de carbure de titane sur l'acier: étude des conditions d'élaboration et des interactions substrat-revêtementDERRE, A; TEYSSANDIER, F; DUCARROIR, M et al.Journal de physique. Colloques. 1989, Vol 50, Num 5, pp C5.445-C5.453, issn 0449-1947Conference Paper

2D modelling of non-confined circular impinging jet reactor; Si chemical vapour depositionWANG, Y. B; CHAUSSAVOINE, C; TEYSSANDIER, F et al.Journal of crystal growth. 1993, Vol 126, Num 2-3, pp 373-395, issn 0022-0248Article

How to avoid characterization of steel substrate during chemical vapour deposition of titanium carbideDERRE, A; TEYSSANDIER, F; DUCARROIR, M et al.Thin solid films. 1991, Vol 202, Num 1, pp 125-135, issn 0040-6090, 11 p.Article

Thermodynamic and kinetic criteria to select hydrocarbon precursorDE PERSIS, S; TEYSSANDIER, F.Journal de physique. IV. 2001, Vol 83, pp Pr3.39-Pr3.46, issn 1155-4339Conference Paper

Précurseurs métallorganiques pour le dépôt chimique à partir d'une phase gazeuse de revêtements dans le système Ti-V-C-N = Metalorganic precursors for chemical vapor deposition in the Ti-V-C-N chemical systemMAURY, F; TEYSSANDIER, F; VALADE, L et al.Annales de chimie (Paris. 1914). 1998, Vol 23, Num 5-6, pp 637-653, issn 0151-9107Article

Deposition paramters controlling CVD of TiC on steelDERRE, A; DUCARROIR, M; TEYSSANDIER, F et al.Journal of the Electrochemical Society. 1989, Vol 136, Num 3, pp 853-858, issn 0013-4651, 6 p.Conference Paper

Thermodynamic and experimental study of CVD of non-stoichiometric titanium nitride from TiCl₄-N₂-H₂ mixturesTEYSSANDIER, F; BERNARD, C; DUCARROIR, M et al.Journal of materials science. 1988, Vol 23, Num 1, pp 135-140, issn 0022-2461Article

Thermodynamic study of the titanium-carbon-nitrogen phase diagram at high temperatureTEYSSANDIER, F; DUCARROIR, M; BERNARD, C et al.Calphad. 1984, Vol 8, Num 3, pp 233-242, issn 0364-5916Article

On the theoretical conditions of chemical deposition of refractory solid solutions: titanum carbonitrideTEYSSANDIER, F; DUCARROIR, M; BERNARD, C et al.Journal of materials science letters. 1984, Vol 3, Num 4, pp 355-358, issn 0261-8028Article

Reactive compatibilization of PA12/plasticized starch blends: Towards improved mechanical propertiesTEYSSANDIER, F; CASSAGNAU, P; GERARD, J. F et al.European polymer journal. 2011, Vol 47, Num 12, pp 2361-2371, issn 0014-3057, 11 p.Article

Pyrolysis behavior of titanocene dichloride used as a precursor for the chemical vapor deposition of titanium carbide at atmospheric pressureSLIFIRSKI, J; HUCHET, G; REYNES, A et al.Chemistry of materials. 1995, Vol 7, Num 4, pp 622-630, issn 0897-4756Article

Chemical vapour deposition of titanium carbide on WC-Co cemented carbidesBISCH, C; NADAL, M; TEYSSANDIER, F et al.Materials science & engineering. A, Structural materials : properties, microstructure and processing. 1995, Vol 202, Num 1-2, pp 238-248, issn 0921-5093Article

Chemical vapor deposition of silicon from disilane under reduced pressure in a circular impinging jet reactor : simulation and experimentsWANG, Y. B; TEYSSANDIER, F; SIMON, J et al.Journal of the Electrochemical Society. 1994, Vol 141, Num 3, pp 824-842, issn 0013-4651Article

SiC-TiC multiphased materials obtained by CVDTOUANEN, M; TEYSSANDIER, F; DUCARROIR, M et al.Materials science & engineering. A, Structural materials : properties, microstructure and processing. 1991, Vol 147, Num 2, pp 239-247, issn 0921-5093Article